Electron beam vacuum deposition device
Metal coating and shadowing become ultra-fine particle deposition, improving resolution!
This device is developed as a deposition system suitable for all metals, particularly magnesium alloys, with the aim of advanced sample preparation in a clean high vacuum using an electron beam. The vacuum exhaust system combines a TMP of 80L/sec and an RP of 50L/min, utilizing fully automated exhaust systems with all electromagnetic valves. The achievable pressure reaches 10^-5 Pa without a liquid nitrogen trap. Additionally, we offer a "Magnetron Sputtering System" for coating tungsten thin films for electron microscopes, as well as a "3KV Ion Gun (SIG030)" used for thin film preparation and surface analysis experimental research. 【Features】 - The vacuum exhaust system combines a TMP of 80L/sec and an RP of 50L/min, utilizing a fully automated exhaust system with all electromagnetic valves. - The achievable pressure reaches 10^-5 Pa without a liquid nitrogen trap. - Metal coating and shadowing are performed through ultra-fine particle deposition, resulting in improved resolution. *For more details, please refer to the related links or feel free to contact us.*
- 企業：アトーテック
- 価格：Other
